Author(s)

Zuocai Dai and Tongguang Yang

Corresponding Author

Zuocai Dai

ABSTRACT

The removal performance of optical materials by ion beam sputtering is investigated in this paper. the bombardment process of Ar+ and Kr+ was simulated through the software TRIM. It is feasible to achieve a high removal rate by using Ar+ ion beam with a big incident angle, which demonstrates that the material removal sputtering yield rises up with the increase of the incident ion energy and incident angle within a certain range. The material removal principle is of great significance to the further performance application of the ion processing in the field of optical processing.

KEYWORDS

Material removal characteristics, ion beam processing, sputtering yield